What Is Reactive Sputtering?

Reactive sputtering means that in the presence of a reactive gas, when the target is sputtered, the target will react with the reactive gas to form a compound (such as a nitride or an oxide). Due to chemical instability when the target is sputtered with an inert gas The film often has one or more components less than the target material. At this time, if a reactive gas can be added to compensate for the missing components, this sputtering can also be considered as reactive sputtering.