What is a thin film evaporator?

thin film evaporator is a machine used to create a thin film. By evaporation or sublimation of various elements, the evaporator of the thin films can store extremely thin layers of atoms or molecules on the substrate material. The machine consists of a vacuum chamber, a heating element and a device that holds and moves the substrate while it is applied a thin film.

There are two primary evaporation types that can be used to create a thin film. These are resistors of evaporation and evaporation of the electron beam. In both of these techniques, the target material is heated in a thin film evaporation until it is evaporated or sublimates. As a gas, the target material moves through the vacuum chamber until it lands on the substrate and creates a thin film. Both techniques require target materials to be as stable as gas.

In resistance evaporation, the electrical current passes through the target material that is hot when it is under voltage. With sufficient heat, Target material evaporates or sublimateis. Gold and aluminum are common target materials that can be evaporated in the form of metal wires called fibers. The target materials in the form of a fiber are difficult to load into the evaporator and can only be processed in small quantities. A thin film evaporator can also use thin sheets of target material, which is often easier to work and bring additional matter when evaporation.

Some target materials are unsuitable for resistance evaporation, as they can get rid of a large part of the solid mass during the process. If these solids collide with the formation of a thin film on the substrate, they can destroy them. The evaporation of these materials requires the use of a closed heating source that allows the gaseous form of the material to escape the small holes when capturing parts of the solid mass in the heating chamber.

Evaporation of the electron beam hits the target material by directing the beam of high energy electrons on it. In this type of evaporatorThe thin film is maintained in the chilled fireplace while the electrons are bombed and heated. This process is useful for target materials with very high evaporation temperature, as the focused energy beam can heat the target material without heating the entire device. The container holding the target material is not exposed to extreme heat, so it does not cause or evaporate during the process. This type of evaporation of thin film requires specific equipment and can be quite expensive.