What Is an Atomic Layer Deposition?

It is a method that can deposit substances one by one on the surface of a substrate in the form of a single atom film. Atomic layer deposition is similar to ordinary chemical deposition. However, in the process of atomic layer deposition, the chemical reaction of the new layer of atomic film is directly related to the previous layer. In this way, only one layer of atoms is deposited per reaction.

Atomic layer deposition (Atomic layer deposition) is a method that can deposit substances on the surface of a substrate layer by layer in the form of a single atomic film. Atomic layer deposition is similar to ordinary chemical deposition.

However, in the process of atomic layer deposition, the chemical reaction of the new layer of atomic film is directly related to the previous layer. In this way, only one layer is deposited for each reaction.

Atomic layer deposition is achieved by

Atomic layer deposition technology has excellent deposition due to its highly controllable deposition parameters (thickness, composition and structure)

Atomic layer

In principle, ALD is passed

The self-limiting and complementary nature of atomic layer deposition (ALD) makes this technology have excellent control over the composition and thickness of the film.

Atomic layer deposition technology due to its highly controllable deposition parameters (thickness, composition and structure)

Atomic Layer Deposition (ALD), originally called Atomic Layer Epitaxy (ALE), is also called Atomic Layer Chemical Vapor Deposition (ALCVD). Atomic layer deposition is the continuous introduction of at least two kinds of gas phase precursor species on a substrate in a heating reactor. The chemical adsorption process is automatically terminated until the surface is saturated, and the appropriate process temperature prevents the physical adsorption of molecules on the surface.

Materials that can be deposited include: oxides, nitrides, fluorides, metals, carbides, composite structures, sulfides, nano-thin layers, and the like.

Atomic layer deposition semiconductor field

Transistor gate dielectric layer (high-k material), coating of photovoltaic elements, diffusion barrier and interconnect barrier layers in transistors (prevents dopant migration), anti-wet coatings for organic light-emitting displays, and thin-film electrophoresis Light-emitting (TFEL) components, interconnect seed layers in integrated circuits, dielectric layers in DRAM and MRAM, dielectric layers embedded in capacitors in integrated circuits, coatings for electromagnetic recording heads, metal-insulator-metal (MIM) in integrated circuits ) Capacitor coating.

Atomic layer deposition nanotechnology field

Hollow nanotubes, tunnel barrier layers, improved photovoltaic cell performance, control of nanopore size, high aspect ratio nanopatterning, seed layers for anti-static resistance coatings and hydrophobic coatings for micro-electromechanical systems (MEMS), nanocrystals , ZnSe coating, nanostructures, hollow nano bowls, storage silicon quantum dot coatings, coatings of nanoparticles, coatings inside nanopores, coatings of nanowires.

The above fields do not represent all possible application fields of atomic layer deposition technology. With the development of science and technology, more and more applications will be found in the near future. According to the characteristics of the reaction principle of this technology, all kinds of different materials can be deposited. Materials that have been deposited include metals, oxides, carbon (nitrogen, sulfur, silicon) compounds, various semiconductor materials and superconducting materials, etc. ^[1] .

Atomic Layer Deposition Manufacturer

There are two types of atomic layer deposition systems: international brands and independent brands. Cambridge is the oldest brand in foreign countries, with hundreds of units sold worldwide. Secondly, Finland's BENEQ and picosun have invested a lot of research and development work in the high-end ALD field, and prepared the thin film by atomic layer deposition. The ALD deposition system is expensive and prohibitive. European Anric is committed to depositing excellent films on small desktops (within 4 to 6 inches) at a low cost. Several domestic equipment companies have completed R & D and launched their own models on the market.