What Is Sputtering?

Splashing is similar to split slicing for long-range ballistic heroes. For melee heroes, it is similar and different from split slash. The biggest difference is that AoE is determined at the target hit by the trajectory, not that the split is determined by where the attacker stands. The current version has a hero, a summoning unit, and a monster with this type of attack. They are: Dragon Knight (transformed into a dragon Queen at levels 2 and 3), Shadow Shaman's Snake Tent, and Black Dragon.

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Unlike Split and Slash, this ability does not exist in the item, because it requires the unit to have a special weapon type.

PVD film preparation technology: sputtering

Sputtering is a kind of PVD thin film preparation technology, which is mainly divided into four categories: DC sputtering, AC sputtering, reactive sputtering, and magnetron sputtering.

PVD film preparation technology: sputtering

The principle is shown in the figure:

Principle: The process of bombarding the target with charged particles, and the impact of accelerated ions on the solid surface, the occurrence of surface atom collision and the transfer of energy and momentum, the target atoms escape from the surface and deposited on the substrate. The phenomenon of bombarding the target surface of a certain material with charged particles (common gas positive ions), so that atoms or molecules on the surface of the target escape from it. At the same time, the sputtering process contains momentum conversion, so the sputtered particles are: Directional.

Uses: Use it to make metal, alloy or dielectric films on the surface of other substrates. It is suitable for manufacturing thin film integrated circuits, chip lead devices and semiconductor devices.

Method: Sputtered films are usually made in a plasma of an inert gas such as argon.

Features: The sputtering process has the advantages of low substrate temperature, pure film quality, uniform and dense structure, good firmness and reproducibility.

Application of sputter coating technology

Wear-resistant oxide film for thin-film magnetic head

Hard disk heads are subject to sliding friction with hard disk surfaces during read and write operations. In order to reduce friction and increase the life of magnetic heads, magnetic heads are currently developing into a thin film.

Insulating films and protective films (ie, AL 2 O 3, SiO 2 oxide films) are the main constituents of thin film magnetic heads. The requirements for the abrasion-resistant film of the thin-film magnetic head are good impact resistance, good abrasion resistance, proper processability, and small processing deformation. Such a film is usually prepared by a reactive sputtering method. In order to prevent the substrate from heating up too much, the substrate is cooled during the sputtering coating process.

2. Preparation of rigid film

The currently widely used hardened film is aqueous chromium plating. Electroplating can cause hydrogen embrittlement in steel, and the plating speed is slow, causing environmental pollution. If a metal Cr target is used and unbalanced magnetron sputtering coating is performed in an N 2 atmosphere, the workpiece can be plated with Cr, CrN X and other coatings, instead of aqueous plating for rotating shafts and other moving parts.

3. Preparation of superhard films for cutting tools and molds

The ordinary chemical vapor deposition technology is used to prepare superhard coatings such as TiN and TiC, and the temperature should be about 1000 , which has exceeded the tempering temperature of high-speed steel. For hard alloys, the grains of the coating may also grow. The single-phase TiN thin film is deposited by using the opposite target sputtering. The sputtering time only needs 10-15 minutes, and the substrate temperature does not exceed 150 . The hardness of the obtained TiN thin film can reach HV3800. The TiN coating prepared by the non-equilibrium magnetron sputtering method shows that the hardness of the coating has reached and exceeded the effects of other ion coatings through the hardness and critical load experiments and friction experiments.

4. Preparation of solid lubricant film

Solid lubricating films such as MoS 2 films have been successfully used in vacuum industrial equipment, atomic energy equipment, and aerospace fields, and are also essential for machinery and equipment working in high temperature environments. Although MoS 2 can be prepared by chemical reaction coating method, the MoS 2 thin film obtained by sputtering coating has good compactness and large film base adhesion. The addition of Au (5wt%) MoS 2 film has better compactness and adhesion. The friction coefficient is smaller.

5. Preparation of optical films

Sputtering is a major process for preparing optical films in industrial production. For a long time, reactive magnetron sputtering technology is mainly used for super-hard films such as TiN on the surface of tools and single or simple layers such as architectural glass, automotive glass, and transparent conductive films. In recent years, the huge demand for optical films in the fields of optical communication and display technology has stimulated the use of this technology in the industrial production of optical films. ^[2]