What is a plasma etching?
plasma etching is a device that uses plasma to create the roads needed by semiconductor integrated circuits. The plasma etching does this by issuing a precisely focused on the plasma nozzle on the silicon wafer. When plasma and wafer come into contact, there is a chemical reaction on the wafer surface. This reaction either stores silica oxide on a wafer, creates electric paths, or removes silicon oxide oxide, leaving only the electric paths. This is first achieved by creating a vacuum in the lepto and creating a high -frequency electromagnetic field. When the gas passes by etching, the electromagnetic field excites the atoms in the gas, causing it to overheat.
As a gas super-horrible, it breaks into the baatoma components SE. Extreme heat also removes external electrons from some atoms and turns them into ions. Before gas leaves the nozzle on the lift in the plasma and reaches the wafers that no longer exists like gas but has become a very thin, overheated stream of ions calledplasma.
If oxygen containing gas is used to create plasma, it will react with silicon on the wafer and form a silica oxide, electrically conductive material. As plasma stream passes across the wafer surface in a precisely controlled way, a layer of silicon oxide reminiscent of a very thin film accumulates on its surface. When the etching process is complete, the silicone plate will have an exact range of silicon oxide. These songs will serve as conductive paths between the integrated circuit components.
plasma etching can also remove From Wafers. When creating integrated circuits, there are cases where a given device may require more surface wafers to be silicon oxide than not. In this case, it is faster and more economical to place the wafer already covered with material into the lift in the plasma and remove unnecessary silicon oxide.
To do this, etch to v vYet creating plasma -based fluorine. When fluorine plasma comes into contact with silica oxide, silicon oxide is destroyed by a chemical reaction. Once the Encher completes his work, only the paths of silicon oxide oxide remain the integrated circuit.